<owl:Class xmlns="https://folio.openlegalstandard.org/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:v1="http://www.loc.gov/mads/rdf/v1#" xmlns:owl="http://www.w3.org/2002/07/owl#" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" xmlns:folio="https://folio.openlegalstandard.org/" xmlns:rdfs="http://www.w3.org/2000/01/rdf-schema#" xmlns:skos="http://www.w3.org/2004/02/skos/core#" rdf:about="https://folio.openlegalstandard.org/Rb1azCsSHRLiyTTBbwGbEiQ">
  <rdfs:subClassOf rdf:resource="https://folio.openlegalstandard.org/RK0ttjFyyS0ytN62EJVzSZg"/>
  <rdfs:label>X202 Patent and Trademark Searching and Monitoring</rdfs:label>
  <skos:prefLabel>X202 Patent and Trademark Searching and Monitoring</skos:prefLabel>
  <skos:definition>Any searching and monitoring costs, including any monitoring or watch service for a trademark, brand or domain name. Excludes on-line legal research (X111) or discovery/eDiscovery culling and filtering (X302).</skos:definition>
</owl:Class>
