<owl:Class xmlns="https://folio.openlegalstandard.org/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:v1="http://www.loc.gov/mads/rdf/v1#" xmlns:owl="http://www.w3.org/2002/07/owl#" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" xmlns:folio="https://folio.openlegalstandard.org/" xmlns:rdfs="http://www.w3.org/2000/01/rdf-schema#" xmlns:skos="http://www.w3.org/2004/02/skos/core#" rdf:about="https://folio.openlegalstandard.org/RqZZ6OiiHRB-d72pQTaLAfw">
  <rdfs:subClassOf rdf:resource="https://folio.openlegalstandard.org/RqZ7vY-cmRNOGHw53EESO8Q"/>
  <rdfs:label>PA450 Post-Issuance Remedial Action - Domestic</rdfs:label>
  <skos:prefLabel>PA450 Post-Issuance Remedial Action - Domestic</skos:prefLabel>
  <skos:definition>All actions associated with completing activities in connection with any necessary remedial action, after issuance of a patent in the ('domestic') home country of the applicant, such as the filing of a Certificate of Correction, and correcting patent term in view of patent term adjustment (mis)calculation in the U.S.. Note that government fees and external expenses are included under E100.</skos:definition>
</owl:Class>
